E-mail: vicent.xia@wafera.com

Semi-Automatic Spray Coating Equipment

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Application range:

  • MEMS

  • Research projects

  • Advanced packaging

  • Ceramic substrates

Equipment features:

1. Small footprint, high stability, and low cost

2. Well-suited for laboratories and R&D projects

3. Unique vacuum hot plate for consistent coating performance

Main parameters:

Main parameters Cassette Quantity 2 CS & 2 LP
Wafer Type Round wafer, Square wafer
Wafer Size(mm) 50-300mm
Atomized Particle Size 15 μm – 40 μm
Configuration 1 spray coating units
Compatible Substrate Materials Si, Glass, Sapphire, GaN, GaAs, SiC
Applicable Processes

TSV, TGV, Bump, Frame, PCB

Plastic ventilation ducts: